Well, you're going to selectively halogenate at the more substituted (secondary) position, due to radical stability, so what you end up with after radical bromination is CH3-CHBr-CHBr-CH3. The problem you run into with treating this with a strong base is that if you use a moderately strong base, you're only going to get one elimination (to the more substituted alkenyl bromide) then be stuck. I think you might be safe using a strong, hindered base like LDA, but not entirely sure.