ITO is the standard answer each and every time a transparent conductor is needed - in fact, the choice is very narrow...
But if you need a limited current density, could surface leaks suffice? Imagine that you pattern very narrow metal lines on your transparent substrate, very close to an other: more than two lines per wavelength will let them appear continuous, and metal much narrower than the separation reduces the reflection or absorption.
Then leaks at the surface of the substrate have only to cover the last 100nm to spread from the metal to the whole surface, and all leaks are in parallel. You can also increase leaks by deteriorating the substrate's surface, say by plasma implantation.
Imagine lines separated by 200nm: at 1cm2, the Rsquare is divided by 2*1010, which is adequate for some uses.