[BrockaFloka]

I am trying to p-dope a silicon wafer, and i am having trouble removing the surface residue after the drive in.

I have tried:

5:1 BOE soak

10% HF soak

1% HF, then 1:1 nitric:sulfuric, then 1% HF

None of these are touching the borofilm layer, which is a blue/white cloudy color.

Any ideas?

[Enthalpy]

Still no answer? I put my two cents worth message then, until someone brings better ideas.

When I processed silicon wafers (during the paleo-semiconductor era), borofilm were indeed difficult to remove, and we had nearly no selectivity for them against the underlying silicon. Essentially, oxidizing with nitric acid and dissolving simultaneously the oxide with fluorhydric acid worked, but it chew the silicon at the same rate.