[slowie]

Hope someone can offer advice:

I am looking to remove fluorine after using it (as ammonium bi fluoride) to dissolve silicon dioxide, my underlying material is a metal oxide but it now has chemically bonded fluorine and is not desired, ideally I would like to remove the silicon dioxide and be left with the Metal oxide only. (I initially dissolved the silicon dioxide using Na OH but this wasn't aggressive enough) Any suggestions on how to chemically clean it ?

I have read that the semiconductor industry would clean using plasma etch, but unfortunately this is out with my reach.

Thanks. J