I imagine that HCl will prevent epoxidation, or will open any epoxide that is formed. The base should also drive any equlibrium in the HOCl formation towards completion.
Maybe. But looking at the patents this part seems only concerned with making the chlorohydrin. They have one tower where they bubble Cl2 through alkaline water and presumably get a solution with HOCl in it. (and NaCl I suppose)
This then gets put into a second tower where they bubble propylene through it. That forms the chlorohydrin which then indeed gets contacted with NaOH or Lime in a seperate section to make the epoxide.
Ergo, the little epoxide that gets formed in stage 1 is incidental. The goal was to make the Chlorohydrin
So then the question is: Would the HCl also inhibit chlorohydrin formation from the alkene? Why?
e.g. The composition of the organic material in the CSTR output contained 91.3 molar-% propylene chlorohydrin (PCH), 4.1 molar-% propylene oxide (PO), and 4.6 molar-% byproducts.