I don't quite get why putting more time in an reason for gold. As it looks, gold isn't used any more, for 15 years. You could first check that. Your teacher may be outdated.
The temperature stability of the resistivity is of very minor importance. There are dozens of constraints on metals that make a process possible or not, designers are happy to find one metal that fits, so temp drift does NOT determine this choice, definitely.
You won't grasp the kind of constraints on metal choice by general chemistry or electricity data. It's more like: how quickly does it diffuse through silicon and through niobium oxide, does it create deep energy levels in silicon and the insulators, does it cover the lower layers uniformly if it's 10nm thick, does it make eutectics with silicon or react with the insulators, can it be etched away with only gaseous products...
When we switched from Al to Au >30 years ago it was mainly to increase the current density in the wires without causing electromigration, the process that transports metal atoms under high current density. But because Au spoils Si so brutally, we had to put before a thin layer of W or Pt that stopped Au diffusing. And because W and Pt make no good ohmic contacts with Si, we had to put first a thin layer of Ti.
That's just to suggest you that the choices are difficult, so difficult that one single metal was impossible, and that no single parameter among the ones you cite had any role.
That was three decades ago, about at the time of the Intel 286. Everything has completely changed many times since, with Cu replacing Au during the PIII era 1.5 decades ago, later with the high-K insulators that probably demanded other metals, and meanwhile Intel has gone through some 15 process generations.